• ASML(Holland) increases the production capacity of the exposure devices for ArF immersion lithography process from 300 units/year to 400 units/year, Nikon also reinforces its capacity from 45 units/year to 90 units/year.
  (The NIkkan Kogyo Shimbun, 10／17）
  
• Sumitomo Chemical to mass-produce ArF immersion lithography photoresists applicable to linewidths with 40 nanometers' process, aiming to be the 3rd position in the world's share.
  (The Chemical Daily, 10／20）
  

• Seiko Instruments develops taransparent metals using 「UV-LIGA」 technology which combine UV lithography with electrocasting technique. Seiko Instruments to adopt them for decorative parts of wrist watches.
  (The Chemical Daily, 9／2）
  
• Bridgestone develops new UV curable heat resistant elastomers, consisting of hydrogenated SBR as polymer chains.
  (The Chemical Daily, 9／4）
  
• The article about 「Hybrid & Dual UV Curing」 by professor Ichimura of Toho univ.
  (The Chemical Daily, 9／5）
  
• Professor Shirai of Osaka Prefecture Univ. & his team develop high sensitivity positive type photoresists by which micro-structured patternig could be formed through screen printing methods.
  (The Chemical Daily, 9／12）
  
• DICcommercializes special UV inks adaptable to LED-UV irradiation devices.
  (The Chemical Daily, 9／17）
  
• Uchida Machinery reinforces the import business of UV drier from GEW (England) for label printing process.
  (The NIkkan Kogyo Shimbun, 9／19）
  
• Kyoeisha Chemical puts a new series of high performance UV hard coatings on the market.
  (The Chemical Daily, 9／24）
  
• Toppan Printing adopts UV printing for their own certificates.
  (The Chemical Daily, 9／24）
  

• JSR accelerates developping topcoate-less ArF type photoresists for immersion lithography processes.
  (The Chemical Daily, 8／1）
  
• Elpida Memory to purchase exposure equipments for ArF immersion lithography processes from ASML(Holland) and Nikon.
  (The NIkkan Kogyo Shimbun, 8／15）
  
• Iwasaki Electric to expand sales of EB irradiation devices for printing processes in Asia, reinforcing sales & technical supports organisations in Asia district.
  (The Nikkei Business Daily, 8／20）
  
• Hitachi High-Technologies reinforces the production capacity of exposure equipments for color filter processes by 150% versus last year, resulting in about 100 units per year.
  (The Nikkei Business Daily, 8／21）
  
• Makuhari Procurement develops UV curable hard-coates to protect surfaces of LCD & polarizing plates etc..
  (The NIkkan Kogyo Shimbun, 8／21）
  
• Idemitsu Kosan puts new products of adamantane derivatives applicable for 32 nanometers line widths photoresists on the markets.
  (The NIkkan Kogyo Shimbun, 8／26）
  

• Pioneer succeeds in developping a 16-layer read-only optical disc with a capacity of 400 gigabytes for the first time in the world.
  (The Nikkei Business Daily, 7／8）
  
• Hitachi Chemical to construct a research center for dry film resists(DFR) technology at Suzhou in China, which is available in 2009. Hitachi Chemicalsupplies now about 30% DFR of the world's demand which is estemated about 800 million square meters.
  (The Chemical Daily, 7／18）
  
• Univ. of Hyogo to install a laboratory in it's synchrotron radiation facility 「New SUBARU」 to characterize EUV resists.
  (The NIkkan Kogyo Shimbun, 7／25）
  

• Advanced Industrial Science and Technology suceeds in the micropatterning by UV irradiation using photodimerization of anthracene.
  (The Chemical Daily, 6／3）
  
• Matsushita Electric Works and Hyogo Prefecture Technology Center for Aguricultural, Forestry and Fishers develop new system which retards powdery mildew of fruits such as strawberry by photo-irradiation.
  (The Nikkei Business Daily, 6／4）
  
• Kobe Univ. and Yumex develop new UV source which uses gadolinium instead of mercury. The emission efficiency is double in comparison with the the conventional.
  (The Chemical Daily, 6／18）
  

• Japan Irradiation Service to construct new EB irradiation facility with 5 MeV of maximum EB energy at Naka county, Ibaraki prefecture, being opereted next April.
  (The Chemical Daily, 5／1）
  
• Prof. Honma and others of Kanto Gakuin Univ. develop new plastic plating process utilizing UV irradiation.
  (The NIkkan Kogyo Shimbun, 5／1）
  
• SunriseMSI develops new UV curable adhesives for tarnsparent plastics such as acrylics.
  (The Chemical Daily, 5／2）
  
• Coattec puts new light-weight UV irradiation devices applicable to field operations on the market.
  (The Chemical Daily, 5／12）
  
• NHV to construct new EB irradiation facility at Tosu city, Saga prefecture, being operated this October.
  (The Chemical Daily, 5／14）
  
• DOWA electronics develops deep ultraviolet LED chips, with wavelength 325-350nm, power 2mw, being the world' highest level.
  (The Chemical Daily, 5／16）
  
• Tomoegawa develops anisotropic diffusion films applicable to the display use, which are prepared through self-organized reactions between photo-polymerizable components with different refractive indices.
  (The Chemical Daily, 5／20）
  
• Semiconductor exposure devices makers to focus double patterning lithography process, giving up high refractive index-immesion lithography, being EUV lithography troubled with insufficient output power.
  (The NIkkan Kogyo Shimbun, 5／22）
  

• Associate prof. Mizuno of Waseda Univ. and Topppan Printing and Toyo Gosei codevelop new LSI multilayer interconnect process utilizing UV nanoimprint technology.
  (The Nikkei Business Daily, 4／16）
  
• Sony Chemical & Information Device develops new optical elastic resin for small LCD, which cure sufficiently in the case of black printings by UV and heating processes.
  (The Chemical Daily, 4／17）
  
• Nippon Paint develops UV curable stumpy surface-forming materials which prevent blots from the LCD surfaces.
  (The Chemical Daily, 4／18）
  
• EINS installs new 10 colors UV printer equipped with inline stamping process for the first time in Asia.
  (The Chemical Daily, 4／23）
  

• JSR develops 32nm line and space patterns for 22nm node semiconductor devices by using a "freezing material" for double patterning, such as double exposure/double etch or double exposure/single etch.
  (The NIkkan Kogyo Shimbun, 3／12）
  
• BASF Coatings Japan puts UV curable automotive refinish systems on the market.
  (The Chemical Daily, 3／25）
  
• Recent developments in UV curable performance materials( Prof. Nishikubo of Kanagawa Univ. )
  (The Chemical Daily, 3／28）
  
• Associate prof. Someya and others of Tokyo Univ. develop the technology to fabricate metallic electrodes on the organic semiconductor layers using inkjet printing techniques, which could be used on the organic EL wide televisions.
  (The Nikkei Business Daily, 3／28）
  

• Mitsubishi Rayon develops new acrylic resin films which could eliminate coatings from the molded articles. Acrylic resin films are laminated with UV curable resin which is cured after the insert molding, resulting in good abrasion resistance and moldability.
  (The Chemical Daily, 2／6）
  
• JSR puts new ArF liquid exposure photoresists, modified topcoates and topcoate-free types on the market.
  (The Chemical Daily, 2／27）
  
• The Kansai Electric Power to construct new irradiation facility at Mihama-cho in Fukui Prefecture, where 10MeV electron beam irradiation device to be installed. New company "Kansai Electron Beam" starts this march.
  (The Nikkei Business Daily, 2／27）
  

Central Glass concludes a contract concerning joint researches about photoresist materials with IBM .
(The Nikkei Business Daily, 1／11）

• SunriseMSI develops UV curable adhesives for temporary fixing which could be peel with normal temperature water.
  (The Chemical Daily, 1／21）
  
• Aqua Science commercializes steam cleaning devices for the semiconductor wafer processing, such as photoresist strips removal and wafer cleaning.
  (The NIkkan Kogyo Shimbun, 1／21）
  
• Sartomer begins to operate new facility in China, Guangzhou this Feb, producing specific acrylates & methacrylates monomers & oligomers for UV curable resins and its capacity 16000t/y. Sartomer is now a chemical division of Total in France.
  (The Chemical Daily, 1／24）
  
• NTT Basic Research Laboratories succeeds in incrasing LED-UV emission intensity as 600% as high comparing with the traditional system, improving the crystal faces of semiconductors.
  (The Nikkei Business Daily, 1／25）
  

• Tokyo Ohka Kogyo develops high performance double patterning photoresists for the next generation lithography processes.
  (The Chemical Daily, 12／3）
  
• Mitsubishi Rayon operates new facility for the acrylic polymer which is used for ArF excimer laser correspondence photoresits at Yokohama.
  (The Chemical Daily, 12／18）
  
• Applied Materials and Tokyo Electron promote the sidewall system for the semiconductor memory of 30 nanometer circuit linewidths.
  (The Nikkei Business Daily, 12／21）
  

• Honshu Chemical Industry expands manufacturing facilities for high performance photoresists of which metal contents are reduced to ppb levels.
  (The Chemical Daily, 11／2）
  
• Mitsubishi Materials develops new UV curable water borne conductive coatings with good antistatic property and transparancy.
  (The Chemical Daily, 11／12）
  
• Japan Recording-Media Industries Association announces the following demand forecast for recording materials: 6billion 328million pieces for CD-R in 2008 (by 7% down against 2007 ); 6billion 195million pieces for DVD recordable in 2008 (by 12% up against 2007 ); 215million pieces for blue-violet laser disc in 2010
  (The Chemical Daily, 11／19）
  
• Miyakawa commercializes new manufacturing device for lightguides which combines ink-jet technology and UV curing, producing them faster by around 30 times, when compared against conventional injection process.
  (The Nikkei Business Daily, 11／30）
  

• Kantum Electronics commercializes LED type UV equipements with illuminance of 600 mW per square centimeters.
  (The NIkkan Kogyo Shimbun, 10／3）
  
• Toshiba adopts Nikon 's new immersion lithography system stepper applicable to 45 nanometers linewidths.
  (The Nikkei Business Daily, 10／19）
  
• Kanematsu Chemicals and Mitsubishi Rayon co-develop UV curable floor coatings 「UFH coat」 and special purpose UV curing devices for them.
  (The Chemical Daily, 10／24）
  

• Toagosei puts new photo-curable acrylic polymers with maleimide moieties, 「Aronix UVT series」 on the market.
  (The Chemical Daily, 9／11）
  
• Dai Nippon Printing develops templates for nano-printing applicable to 18 nano-meters semiconductor processing.
  （The Nikkei Business Daily, 9／18）
  
• Chisso develops new photo-curable inks which are ink-jet printable.
  (The Chemical Daily, 9／26）
  

• Toyo Aluminium Shoji develops LED type UV irradiation devices for which optical fibers are equipped as light guide parts.
  (The Chemical Daily, 8／9）
  
• Tsunooka professor emeritus of Osaka Prefecture Univ.:Recent topics and future prospects of UV/EB curing technology.
  (The Chemical Daily, 8／9）
  
• Epson Imaging Devices develops the alternative chemicals for cured photoresist remover,「2-amino ethanol」.
  (The Chemical Daily, 8／13）
  

• Ishizaka assistant professor & others of Tohoku Univ. develop new rare earth (ex. Europium) doped polyimides which can emit light on photo-irradiation and quench on heating.
  (The Chemical Daily, 7／30）
  

• Asahi Kasei develops new resins which are available for the patterning of semiconductors and the electrolyte membrane of fuel cells, improving their resolution.
  （Nikkei Business Daily, 6／5）
  
• Sumitomo Chemical develops new photoacid generators(PAG) for the ArF immersion lithography system.
  (The Chemical Daily, 6／11）
  
• Sony Chemical & Information Device, Dainippon Ink & Chemicals, Nippon Kayaku reinforce the production of UV curable resins for covercoates of Blu-ray Discs(BD).
  (The Chemical Daily, 6／14）
  
• JSR to introduce a immersion scanning apparatus to accelarate the development of new photoresists for the next generation semiconductor production. Tokyo Ohka Kogyo already installed a immersion scanner.
  (The Chemical Daily, 6／20）
  
• Jujo Chemical develops new UV curable resins for in-mold system, improving the workability and the heat resitant property.
  (The Chemical Daily, 6／27）
  

• Honny Chemicals develops UV curable cationic electrocoats for plastic parts.
  (The Chemical Daily, 5／1）
  
• Hitachi Chemical began to operate new dry film photoresist( DFR ) production facility( manufacturing capability : 50million square meters/year ) in Suzhou, China. The total DFR manufacturing capability of Hitachi Chemical to be 150million square meters/year in China.
  (The Chemical Daily, 5／9）
  
• New Energy and Industrial Technology Development Organization( NEDO ) succeeds to get the resolution of 26 nm in EUV lithography technology, as the top rung of the ladder in the world.
  (Nikkan Kogyo, 5／31）
  

• Sony Chemical & Information Device commercializes the elastic resin 「Super View Resin(SVR)」 which improves the visibility and the impact resistance of LCD. Its main constituent is UV curable acrylic.
  (The Chemical Daily, 4／13）
  
• Idemitsu Technofine develops new tranparent conductive coatings, preparing UV curables and conventionals.
  (The Chemical Daily, 4／16）
  
• Nitride Semiconductors commercializes new UV LED which has longer durability by ten times comparing to the conventionals. It can be used for curing photo-curable resins and exciting fluorescence materials.
  (Nikkan Kogyo, 4／20）
  
• Toyo Ink Mfg to put the UV system for the wide color rendering sheet-fed process inks for the off-set printing use.
  (The Chemical Daily, 4／25）
  

• Nippon Kasei develops UV curable resin whichi is able to maintain its antistatic effect more than 5 years.
  （Nikkei Business Daily, 3／1）
  
• Prof. Kinoshita of Univ. of Hyogo develops new chemically amplified resists which are more sensitive than conventionals by 10 times against the EUV and the EB exposure of 13.5 nanometers wave length. It makes possible for the existing 50W light source to be applied at the EUV lithography process using these resists.
  （Nikkan Kogyo Shinbun, 3/6）
  
• Nichiban commercializes UV coated wax-sheets for the floor use.
  (The Chemical Daily, 3／13）
  
• Uchida Techno bigins the UV printing business, printing designs on the interior decorative materials( bumpy surfaces, textiles ) using UV inks.
  （Nikkei Business Daily, 3／16）
  
• SAKATAINX develops UV curable super gloss overcoat finishes applicable on oil inked surfaces at the inline process.
  (The Chemical Daily, 3／23）
  

• Prof.Ichimura of Toho Univ. "Next Generation UV/EB Curing Technology"
  (The Chemical Daily, 2／19）
  
• NEC and NEC Electronics develop new film formation technology of 32 nanometers line widths based on polymeization process for the next generation semiconductors.
  （Nikkei Business Daily, 2／19）
  
• Sanmei puts new cost-effective decalcomania devices which generate circuit patterns using photo-nano-inprint technology on the market.
  （Nikkan Kogyo Shinbun, 2/20）
  
• World market shear of UV curable resins for DVD( UV adhesives & UV protective coatings )
  First/Dainippon Ink & Chemicals(45%), Second/Nippon Kayaku(25%), Third/Sony Chemical & Information Device
  Global Demand for Blue Laser Disk (include BDs & HD DVDs ) will grow up to 141 million units in 2009.

• Material Science opens the open laboratory which deals with UV curable powder coating technology at Okaya city, Nagano prefecture.
  (The Chemical Daily, 1／9）
  
• Denki Kagaku Kogyo develops new UV curable temporary adhesives for electronic parts assembly. The adhesive layers could be peeld off easily when those meet hot water.
  (The Chemical Daily, 1／11）
  
• Matsushita Electric Works Machine & Vision develops new LED type UV irradiation device which has twice the illuminance as compared with the one used to be. It has 8000 milliwatt per square centimeters.
  （Nikkan Kogyo Shinbun, 1/15）
  
• JSR and Kanagawa Univ. co-develop new photoresists which cope with the EUV technology, using the new low molecular weight compounds developed by prof. Nishikubo of Kanagawa Univ..
  （Nikkei Business Daily, 1／22）
  
• Sunrise MSI reinforces the lineup of UV curable adhesives for optical parts assembly.
  (The Chemical Daily, 1／29）
  

JSR develops new liquid exposure materials having 1.78 refractive index for immersion wet etching system which aim at the semiconductor production of 32 nanometers linewidths.
（Nikkei Business Daily, 12／4）

• Kyowa-Seisan develops new natural wood panels which are directly printed by ink-jetting with UV inks.
  （Nikkei Business Daily, 12／4）
  
• Fujifilm develops new photoresists which need no topcoat for immersion wet etching system aiming at the next generation semiconductor production of 45 nanometers circuit linewidths.
  （Nikkei Business Daily, 12／5）
  
• NTN develops new devices which automatically detect and repair the defects of color filters for LC, those make lines full-automation.
  （Nikkei Business Daily, 12／6）
  
• Toray Industries develops new visible light curable epoxy-type resins for carbon fiber reinforced plastics(CFRP), which cure within 10 minutes.
  （Nikkei Business Daily, 10／5）
  
• Asahi Kasei EMD develops new dry film photoresists for black matrices of LC display,which have OD value, index for light shielding, more than 5.0 per 1μmeters.
  (The Chemical Daily, 12／7）
  

• Mitsubishi Rayon develops Optical Low Pass Filter(OLPE) made of photo-curable polymers which can be applied to small cameras in cellular phones.
  (The Chemical Daily, 11／9）
  
• Toa Grout and Shonan Plastic Mfg. to develop new materials and a new construction method to refurbish underground pipelines. The system cures liners impregnated with UV curable resins by UV radiation and remaining heat generated at the curing process.
  (The Chemical Daily, 11／16）
  
• The Japan Recording-Media Industries Asso. (JRIA) forecasts for global demand and production of recording media products: Global demand for Write-once DVDs will grow up to 6,923 million units in 2009 ( 4,731 million in '06 ), Global Demand for Blue Laser Disk (include BDs & HD DVDs ) will grow up to 141 million units in 2009 ( 1 million in '06 ) and so on.
  (The Chemical Daily, 11／20）
  
• Fujifilm develops photoresists for EUV process, which are able to resolve 25 nanometers widths of line.
  (The Chemical Daily, 11／21）
  
• Tokyo Ohka Kogyo to develop the photoresist technology which cope with ArF immersion wet etching & double exposure to take a step for hp32 nanometers process.
  (The Chemical Daily, 11／24）
  
• Dai Nippon Printing to develop templates which cope with hp22 nanometers process. They succeeded already the L/S patternig for hp28 nanometers process.
  (The Chemical Daily, 11／2７）
  

• Toyo Ink Mfg. develops UV clear overcoat which keeps high gloss on the oil inked substrates.
  (The Chemical Daily, 10／4）
  
• Fujifilm to develop UV inks with Sericol groups which were purchased by Fujifilm last year.
  (The Chemical Daily, 10／4）
  
• Hitachi Chemical develops photosensitive films for glass etching, forming micro patterns on the glass. Films are hydrofluoric acid resistant and adhere to the glass well.
  (The Chemical Daily, 10／5）
  
• Prof. Takatani of Osaka Univ. develops new laser molding techniques capable of molding very thin parts, not more than 1millimeter thick, in a very short time, adequete to design parts for cellular phones.
  （Nikkei Business Daily, 10／5）
  
• Jujo Chemical commercializes UV screen inks which adhere to glass well.
  (The Chemical Daily, 10／6）
  
• Dinippon Ink & Chemicals develops decorative tapes for automobile use which have three layers, namely a PVA layer, a UV curable resin layer, and a design layer. When they are applied to panels, washing out the PVA layer, curing the UV resin layer to protect the design layer, the system eliminates the spray paintig to reduce VOC discharge.
  （Nikkei Business Daily, 10／12）
  
• Taiyo Ink Mfg. and duPont agree to co-develop new semicoductor package materials such as issulation films.
  (The Chemical Daily, 10／13）
  
• Tokyo Ohka Kogyo and Hitachi co-develop new photoresist materials, low molecular weight polyphenols, to cope with the EUV technology.
  （Nikkan Kogyo Shinbun, 10/17）
  
• Miyakawa commercializes new lightguides producing equipments which consist of ink-jet system and UV curing system, eliminating molds.
  （Nikkei Business Daily, 10／23）
  
• Toppan Printing bigins to produce LC-TV color filters which cope with the 8th generation glass panels (2.16m×2.46m).
  （Nikkan Kogyo Shinbun, 10/24）
  
• Toray Industries to double the production capacity of the photosensitive paste materials for PDF, reaching 5160tons/year.
  （Nikkan Kogyo Shinbun, 10/26）
  
• Articles for the 20th anniversary of the foundation of RadTech Japan, interview with the president of RadTech Japan, prof. Nishikubo.
  (The Chemical Daily, 10／26）
  
• Toray Industries develops the nano-level technology to modify fibers with high energy irradiation such as UV, FB, MW, commercializing new textiles with good water repellecy and color vision next spring.
  （Nikkan Kogyo Shinbun, 10/30）
  

• Sumitomo 3M commercializes good crack resistant UV inks for industrial IJ printers.
  (The Chemical Daily, 9／12）
  
• Denki Kagaku Kogyo enhances selling UV adhesives 「Hard Lock UV」 for manufacturing electronics parts.
  （Nikkan Kogyo Shinbun, 9/25）
  

• Alps Electric develops micro-structured molds to produce fiber optical communication components. Leads with 10 micrometers width could be injection-molded through them using the photo-nano-inprinting technology.
  （Nikkei Business Daily, 8／11）
  
• Dai Nippon Printing to produce ink-jet method color filters for the eight generation LCD panels of Sharp. They say the ink-jet methods cut the overall cost by about 20% .
  （Nikkei Business Daily, 8／30）
  

• Nikon commercializes new stepper「ＮＳＲ−Ｓ６１０Ｃ」 for immersion wet etching system, which copes with the semiconductor production under 45 nanometers linewidth, equipped projector lenses with NA1.30.
  （Nikkan Kogyo Shinbun, 7/7）
  
• JSR under developping the third products for ArF immersion wet etching system, the immersion liquid which has the refractive index more than 1.8 to increse the resolution.
  (The Chemical Daily, 7／12）
  
• Ishikawajima-Harima and Fujikura co-develop radiation resistant electric wires made of polyetheretherketone in co-operation with Japan Atomic Energy Agency.
  （Nikkan Kogyo Shinbun, 7/13）
  
• Toppan Forms and T&K TOKA co-develop UV curable inks with good deinking authorized by eco mark, to be adopted for printing post cards which hide personal information.
  （Nikkan Kogyo Shinbun, 7/20）
  
• Taiyo Ink Mfg. commercializes white colored photoresist inks with higher reflectance and longer life more than green ones, which increase the brightness of LED by about 20%.
  （Nikkei Business Daily, 7／25）
  

• Seiko Epson develops the technology to form silver wiring on the low temperature polycrystalline silicon TFT using ink-jet techniques.
  （Nikkei Business Daily, 6／21）
  
• Miyakawa develops new lightguides which are set with UV cured epoxy resin micro-lenses.
  （Nikkei Business Daily, 6／22）
  
• Association of Super-Advanced Electronics Technologies(ASET) researches in new chemically amplified resists for EUV process which have the sensitivity of 10〜３０mJ per square centimeters, the resolution of 28〜32 nanometers. This year, ASET to develop resists of L/Ｓ 30nanometers, LER 3.0nanometers, sensitivity 5mJ per square centimeters to practical use.
  (The Chemical Daily, 6／28）
  
• NTT sucseeds in the uniform coatings of photoresists on the surfaces of cubic circuit board ,making resists solution mist through supersonic process.
  （Nikkan Kogyo Shinbun, 6/28）
  

• Dow Corning Toray develops UV curable scratch proof & antifouling silicone coatings to protect the surface of display panels.
  (The Chemical Daily, 5／1）
  
• Musashi Paint Company and Kagawa Chemical develop UV curable waterborne coatings to protect the surface of plastic cabinets. Musashi Paint Company is the No.1 supplier of paints for cellular phones in Japan.
  (The Chemical Daily, 5／2）
  
• Prof. Watanabe ofTokyo Univ. of Agriculture and Technology develops new material which bend and recover its shape through light irradiation on-off. The material is composed of azobenzene and polyimide.
  （Nikkei Business Daily, 5／9）
  
• 「UV/EB curing technology supports the technology inovation of Information Technology Industry」
  Prof. Nishikubo President of RadTech Japan, Vice-President of Kanagawa Univ.
• World Semiconductor Trade Statistics predicts that the world semiconductor market keeps its market growth from 06 to 08, and the average growth rate to be 11.3% during these three years, the market volume to be 313.5 billion $ in 08.
  （Nikkan Kogyo Shinbun, 5/31）
  

• Arakawa Chemical Industry develops new technology to apply photo-curable resins on the LC panels as hard coatings. Water is used as a diluent.
  （Nikkei Business Daily, 4／3）
  
• Kansai Paint develops new resin containing inorganics, which generate circuit pattern on the substrates by screen printing method.
  （Nikkei Business Daily, 4／5）
  
• Hitachi Chemical to construct new facility for dry film resist in China. It bigins to operate in next Feb., producing fifty millions square meters products per year.
  （Nikkan Kogyo Shinbun, 4/7）
  
• Showa Denko develops new additives which improve the hardness and the density of photo-curable resins by about 20%.
  （Nikkei Business Daily, 4／12）
  
• ATOMIX develops UV curable inorganic-organic hybrid resins.
  (The Chemical Daily, 4／28）
  

• Seiko Epson and Sumitomo Chemical co-develop printer heads with organic EL as light sources, getting more uniform images.
  (The Chemical Daily, 3／15）
  
• Dainippon Ink & Chemicals increses the production of UV coatings and adhesives for photo-discs by 1.7 times to 2500tons per year in Holland to keep its about 60% shear in the world.
  （Nikkei Business Daily, 3／15）
  
• Osaka Organic Chemical Industry begins to supply monomers for LSI photoresists which meet ArF excimer laser use, aiming to sell 12M$ and get 50% shear in 2010.
  (The Chemical Daily, 3／16）
  
• SEMATECH shapes its course for the next generation semiconductor lithographic process, to adopt ArF immersion wet etching and EUV exposure for above and under 45 nanometers linewidths, respectively.
  (The Chemical Daily, 3／29）
  

• Sumitomo Electric Fine Polymer to construct a new facility for EB croslinked heat-shrinkable plastic tubes in Suzhou, China, to be operated early in the next year.
  （Nikkei Business Daily, ２／２）
  
• AZ Electronic Materials doubles the production capacity of resists for liquid crystal panels at Shizuoka factory to keep about 65% shear in the world till '09.
  (The Chemical Daily, ２／７）
  
• Nippon Synthetic Chemical Industry enhances its adhesive business, putting new UV curable acrylic adhesives on the market.
  (The Chemical Daily, ２／８）
  
• JSR & IBM succeeds in semiconductor patterning under 30 nanometers line widths, using JSR's photoresist and IBM's immersion wet etching system for ArF.
  （Nikkei Business Daily, ２／２２）
  

• Arakawa Chemical Industries & Osaka Municipal Technical Research Institute co-develop new photo-curable organic-inorganic hybrid materials, utilizing ene/thiol chemical reaction.
  （Nikkei Business Daily, １／１）
  
• Tokyo Ohka Kogyoto expand the ArF&KrF photoresist production capacity 1.5 times in its Koriyama plant.
  （Nikkei Business Daily, １／１３）
  
• Hitachi Chemicalbigins to operate new facility for photosensitive dry film in China, doubles its production capacity to 100 million square meters per year.
  （Nikkei Business Daily, １／１７）
  
• Dainippon Screen Mfg.promotes the industrial ink-jet printer business, utilizing the technology of UV inks and device controls from Inca Digital Printers.
  （Nikkei Busines Daily, １／２７）
  

* Miyakawa Office presents articles by permission of The Chemical Daily, Nikkei Business Daily, Nikkan Kogyo Shinbun.