• Mitsui Chemicals develops new thermoset & UV curable nanoimprint materials based on chrystalline fluoropolymers.
  (The Chemical Daily, 6／4）
• Hitachi Chemical puts new photoresist films for interposers on the market.
  (The Chemical Daily, 6／4）
• Mitsubishi Chemical develops new solar beam resistant UV curable hard coatings.
  (The Nikkei Business Daily, 6／4）
• Fujifilm reinforces the Intelligent Printed Circuit Board Exposure System 「INPREX」 business in Asia territory.
  (The Chemical Daily, 6／9）
• Evonic Degussa Japan puts new matting agents for UV coatings on the market.
  (The Chemical Daily, 6／14）

• JSR & SEMATECH(USA) to co-develop new photoresists applicable to the next genaration EUV semi-conductor lithography process.
  (The Chemical Daily, 5／19）
• Osaka Organic Chemical Industry puts new series of special acrylic monomers on the market, these are 「V-1000」, 「DOL」 & 「ＤＸＥ」. 「V-1000」 are multi-functional monomers which reduce the shrinkage of UV cured resin by 20〜30%.
  (The Chemical Daily, 5／27）

Shin-Etsu Polymer puts new UV curable transparent hard coatings with good antistatic property on the market.
(The Chemical Daily, 4／7）
• Nippon Paint develops UV curable anti-interference fringe coatings and non-solvent type UV curble hard coatings.
  (The Chemical Daily, 4／9）
• Teikoku Printing Inks Mfg. develops UV screen inks with good heat resistance and adhesive property for the insert molding process.
  (The Chemical Daily, 4／9）
• Ushio puts optical film roll-imprinting( embossing finish ) devices combining with UV curing system on the market.
  (The Chemical Daily, 4／15）
• Nissan Chemical develops new organic・inorganic hybrid materials for optical interconnectig.
  (The Chemical Daily, 4／20）
• ThreBond puts new UV curable sheet adhesives for LC panels on the market.
  (The Chemical Daily, 4／21）
• Nippon Steel Chemical develops new UV/heat curable resin, divinylbenzene/styrene/acrylate with high heat resistance & high transparence for optical devices.
  (The Chemical Daily, 4／23）
• T&K TOKA to operate new facility for UV inks (5000t/Y) in Saitama prefecture, resulting in its production capacity of 10000t/Y and its market share of 60% in Japan.
  (The Chemical Daily, 4／30）

• Mitsubishi Chemical develops new fulleride-type molecular resists which respond to the EUV lithography.
  (The Chemical Daily, 3／3）
• Emeritus prof. Tsunooka of Osaka Prefecture Univ."New Trend on UV Curing Technology"
  (The Chemical Daily, 3／16）

• USHIO puts two new spot UV exposure devices "Spot Cure" s (LED system & the lightest in the industry, Lamp system) on the market.
  (The Chemical Daily, 2／1）
• JSR develops new non-topcoat self-freezing ArF photoresist for double patterning process, achieving 26 nm half pitch line and space patterns.
  (The Chemical Daily, 2／23）

• Fuji Film develops new photoresists for 1coat-double patterning process( applicable to the 20 nm linewidths system ).
  (The Nikkei Business Daily, 1／1）
• Mitsubishi Rayon develops new acrylic film for UV imprinting, having very small diferences concernig refractive index with UV cured resin.
  (The Chemical Daily, 1／15）
• Kanagawa Univ. develops new ladder type acyclic compound based EUV photoresists with low molecular weight.
  (The Chemical Daily, 1／18）
• Denki Kagaku Kogyo commercializes UV curable cation epoxy type adhesives.
  (The Chemical Daily, 1／19）
• Panasonic Electric Works develops new UV curable acrylic resin applicable to LED light sources.
  (The Chemical Daily, 1／20）
• Dai Nippon Printing develops the most thinest, 0.38mm built-in electric parts PC boards in the world.
  (The Nikkei Business Daily, 1／20）
• Arakawa Chemical Industries develops pine resin based additives for UV adhesives, which make adhere possible to polyorefin parts.
  (The Nikkei Business Daily, 1／21）

• Tokyo Ohka Kogyo develops new freezing process free type double patterning photoresists and new low molecular type photoresists for EUV.
  (The Chemical Daily, 12／4）

• Scalar and Prof. Koike of Keio Univ. develop polymer-made planar lens.
  (The Nikkei Business Daily, 11／11）
• JSR develops new photo-curable resin for microlens, of which refractive index is 1.54.
  (The Chemical Daily, 11／18）
• Toshiba develops new photoresists for the next generation EUV lithogrphy, whose linewidths is 20 nanometers level.
  (The Nikkan Kogyo, 11／18）
• Mitsubishi Gas Chemical commercializes N-Methylformaide( NMF ) which could remove cured photoresists.
  (The Nikkei Business Daily, 11／19） Soken Chemical & Engineering develops cost-effective resin molds for UV nanoimprinting.
  (The Chemical Daily, 11／27）

• ASML( Holland ) puts the latest scanners applicable to ArF double immersion/double exposure system on the market.
  (The Chemical Daily, 10／9）
  
• Taniguchi Ink MFG commercializes UV seal printing inks applicable to the letterpress process.
  (The Chemical Daily, 10／13）
  
• Tokyo Ohka Kogyo enters the TSV( through silicon via ) system business, providing photoresists and other materials necessary for TSV patternig.
  (The Nikkei Business Daily, 10／16）
• SRI Hybrid develops high abrasion resistant blankets 「S-PRIA UV」 applicable to UV offset printing inks.
  (The Chemical Daily, 10／19）
  

• Mitsubishi Gas Chemical to expedite sales of dioxane glycol(DOG) which is a raw material of UV adhesives for BD.
  (The Chemical Daily, 9／1）
  
• Prof. Ishihara & his co-workers of National Defense Medical College develop UV curable hemostat using photo-curable hydrogels.
  (The Nikkan Kogyo, 9／2）
  
• Heraeus puts new compact UV lamp units using circle type lamps on the market.
  (The Nikkan Kogyo, 9／22）
  
• UV/EB curing technology & inventions/Prof. Ichimura of Tohho Univ.
  (The Chemical Daily, 9／29）
  
• Dainichiseika Color & Chemicals Mfg. puts new odor reduced UV inks and new UV inks with enhanced luminance on the market.
  (The Nikkei Business Daily, 9／30）
  

• Arakawa Chemical Industries to construct new 4000t/Y facilites for UV curable resin which to be operated in 2011.
  (The Nikkan Kogyo, 8／12）
  
• Showa Highpolymer to out-migrate the productin of photopolymer for photoresists from Japan to China.
  (The Chemical Daily, 8／13）
  
• KSM puts the photoinitiator embeded UV curable resin on the market.
  (The Chemical Daily, 8 ／19）
  
• Taisei Fine Chemical develops new UV curable acrylic polymer which is copolymerized with macromomer, introducing methacryloyl group to the side chain.
  (The Chemical Daily, 8／28）
  

• Feature on UV・EB irradiation technology
  (The Nikkan Kogyo, 7／10）
  
• Mittsubishi Rayon develops new acrylic films with exellent heat-formability and abrasion-resistance, on which special photo-cured acrylics are laminated.
  (The Chemical Daily, 7／31）
  

• Asahi Glass to begin the UV curabke nano-imprinting materials business.
  (The Chemical Daily, 6／5）
  
• DMDF commercializes new grades of dry films for photoresists, improving the tent property & the exposure sensitivity.
  (The Chemical Daily, 6／5）
  
• Sony Chemical & Information Deviceexpands the line-up of UV curable resins for Blu-ray Disc process, aiming at pit resin use and base resin use.
  (The Chemical Daily, 6／9）
  
• Taiyo Ink MFG. develops non-sovent, dual cure(UV ＋Thermo Cure)-type insulation materials applicable to ink-jet coatingｓ for circuit boards.
  (The Chemical Daily, 6／12）
  
• Fujifilm Graphic Systems develops new film-type soldar masks, for the purpose of thinning and cost cutting.
  (The Chemical Daily, 6／12）
  
• Dai Nippon Printing develops new photobase generators for the next generation high density circuit boards, which reacts about one fiftith of UV irradiation comparing with the conventionals.
  (The Nikkan Kogyo, 6／23）
  
• ADELL develops new visible light curable adhesives for bonding glass and acrylics.
  (The Chemical Daily, 6／24）
  
• Panasonic Electric Works commercoalizes high power LED UV irradiation devices for the printing process.
  (The Nikkei Sangyo, 6／25）
  
• Kaneka puts UV curable polyacrylate-type liquid resin 「KANEKA XMAP｣ on the market.
  (The Chemical Daily, 6／25）
  
• Toshiba develops new photoresists with low molecular weight-truxene derivatives for the next generation EUV lithography system.
  (The Chemical Daily, 6／26）
  

• IMEC (Belgium) succeeds in trial production of SRAM cell on the 22 nanometers linewidths process using EUV lithography technology.
  (The Chemical Daily, 5／12）
  
• Iwasaki Electric puts Energy Science (ESI) made EB devices for printing use on the Japanese market.
  (The Nikkei Business Daily, 5／13）
  

• TECHNO ASSOCIE becomes an exclusive selling agent with Taipeiplas concerning UV coated elastomers which Taipeiplas has developped.
  (The NIkkan Kogyo Shimbun, 4／10）
  
• Toagosei develops new UV curable resins, which are monomer with acryloyl and maleimide groups, oxazolidone acrylate and tin-free urethane acrylate.
  (The Chemical Daily, 4／13）
  
• Toyo Ink MFG. commercializes LED curable inks for package printing, eliminatig thermal deformation troubles.
  (The Nikkei Business Daily, 4／14）
  
• Asahi Kasei develops the world' first all fluorocarbon transparent resin which is cured by UV/heat set.
  (The Chemical Daily, 4／17）
  
• Sales of UV curable temporary joint adhesives by Denki Kagaku Kogyo increases.(The Chemical Daily, 4／28）
  
• Professor Nakajima and his team of Kyushu Univ. develop new flexible materials which shrink by near infrared radiation. They are composed of carbon nanotube and isopropyl acrylamide.
  (The Nikkei Business Daily, 4／28）
  

• Toyo Gosei commercializes small experimental devices for UV nanoprinting, for which the special purpose resins are 'PAK-01'.
  (The Chemical Daily, 3／6）
  
• Semiconductor Leading Edge Technologies( Selete ) succeeds in prototype manufacturing of chips using EUV exposure process for the first time in Japan.
  (The Nikkei Business Daily, 3／9）
  
• Daicel Chemical Industries develops new UV-cation cured clad materials for optical waveguides.
  (The Chemical Daily, 3／23）
  

• Mitsubishi Gas Chemical develops new photoresits applicable for 13.5 nano-meters wavelength EUV.
  (The Nikkei Business Daily, 2／6）
  
• Sumitomo Chemicalbigins to operate new facility for ArF immersion-type photoresists this March. Its annual capacity of production is about 50 thousand gallons, they aim to grab one third share of the world market.
  (The Chemical Daily, 2／18）
  
• Dai Nippon Printing develops new polyphenol-type photoresists applicable for photomasks of 15 nano-meters circuit line width's generation which are in practical use in '20-'30.
  (The NIkkan Kogyo Shimbun, 2／23）
  
• Sakata Inx reinforces the ink business for ink-jet machines, developping new UV curable inks for ink-jet system.
  (The Chemical Daily, 2／24）
  

• Nikon makes a start to apply double patterning systems for period after next generation semiconductor processes.
  (The NIkkan Kogyo Shimbun, 1／8）
  
• Alps Electric develops new UV senser using zinc oxide film as base materials, eliminating filters in case of using gallium arsenide.
  (The Nikkei Business Daily, 1／16）
  
• Chisso to put polyimide inks and photo-curable inks into practical use for circuits devices by ink-jet system.
  (The Chemical Daily, 1／20）
  
• D-MEC to be a distribution agent in Japan for photo-fabrication devices of 3D Systems (USA).
  (The Chemical Daily, 1／21）
  

• Toyo Ink Mfg commercializes new UV inks with high quality & high throughput for paper package printings.
  (The Chemical Daily, 12／8）
  
• Aobado Printing to itroduce a UV printing line next Feb.(about $2million).
  (The NIkkan Kogyo Shimbun, 12／8）
  
• ORC Manufacturing enforces sales of 'direct UV exposure equipment' which describe directly electronic circuits on substrates without photomasks.
  (The Nikkei Business Daily, 12／8）
  
• JSR develops photo-curable insulating materials for semiconductor processes which reduce the production cost by 50% around, eliminating photoresists from the production lines.
  (The Nikkei Business Daily, 12／12）
  
• Techno Roll to expand sales of plastic rolls for UV printing machines in Europe, making a contract with Westland in Germany.
  (The NIkkan Kogyo Shimbun, 12／12）
  
• Tokyo Ohka Kogyo develops new high throughput positive photoresists with twice/double exposure for the next generation semiconductor processes.
  (The Chemical Daily, 12／18）
  
• Mitsubishi Rayon installs the mass production line of UV curable hard coatings for Blu-ray discs( production capacity, 1000t/y).
  (The Chemical Daily, 12／24）
  

• Nikon puts new scanner for immersion lithography on the market, increasing the processing capacity and the accuracy of superposition.
  (The Chemical Daily, 11／10）
  
• Osaka Organic Chemical Industrycommercializes new biocompatible monomers, carboxymethyl betaine monomer( GLBT ) and glucosamine monomer( GUMA ).
  (The Chemical Daily, 11／17）
  
• Mitsubishi Gas Chemical Company and Semiconductor Leading Edge Technologies( Selete ) develop new resist materials for next-generation lithography, based on aromatic aldehyde technology.
  (The Chemical Daily, 11／19）
  
• Toray develops new photosensitive polyimide coatings to prevent damaging of wirings and sealings on the semiconductor packaging.
  (The Chemical Daily, 11／21）
  
• Professor Ichimura & his coworkers of Toho univ. succeeds in quantity synthesis of dendrimers, developping new ene-thiol type UV curable materials.
  (The Chemical Daily, 11／25）
  

• ASML(Holland) increases the production capacity of the exposure devices for ArF immersion lithography process from 300 units/year to 400 units/year, Nikon also reinforces its capacity from 45 units/year to 90 units/year.
  (The NIkkan Kogyo Shimbun, 10／17）
  
• Sumitomo Chemical to mass-produce ArF immersion lithography photoresists applicable to linewidths with 40 nanometers' process, aiming to be the 3rd position in the world's share.
  (The Chemical Daily, 10／20）
  
• Origin Electric puts new coatings for vapor deposition process on the market, both UV curable and conventional types.
  (The Chemical Daily, 10／27）
  

• Seiko Instruments develops taransparent metals using 「UV-LIGA」 technology which combine UV lithography with electrocasting technique. Seiko Instruments to adopt them for decorative parts of wrist watches.
  (The Chemical Daily, 9／2）
  
• Bridgestone develops new UV curable heat resistant elastomers, consisting of hydrogenated SBR as polymer chains.
  (The Chemical Daily, 9／4）
  
• The article about 「Hybrid & Dual UV Curing」 by professor Ichimura of Toho univ.
  (The Chemical Daily, 9／5）
  
• Professor Shirai of Osaka Prefecture Univ. & his team develop high sensitivity positive type photoresists by which micro-structured patternig could be formed through screen printing methods.
  (The Chemical Daily, 9／12）
  
• DICcommercializes special UV inks adaptable to LED-UV irradiation devices.
  (The Chemical Daily, 9／17）
  
• Uchida Machinery reinforces the import business of UV drier from GEW (England) for label printing process.
  (The NIkkan Kogyo Shimbun, 9／19）
  
• Kyoeisha Chemical puts a new series of high performance UV hard coatings on the market.
  (The Chemical Daily, 9／24）
  
• Toppan Printing adopts UV printing for their own certificates.
  (The Chemical Daily, 9／24）
  

• JSR accelerates developping topcoate-less ArF type photoresists for immersion lithography processes.
  (The Chemical Daily, 8／1）
  
• Elpida Memory to purchase exposure equipments for ArF immersion lithography processes from ASML(Holland) and Nikon.
  (The NIkkan Kogyo Shimbun, 8／15）
  
• Iwasaki Electric to expand sales of EB irradiation devices for printing processes in Asia, reinforcing sales & technical supports organisations in Asia district.
  (The Nikkei Business Daily, 8／20）
  
• Hitachi High-Technologies reinforces the production capacity of exposure equipments for color filter processes by 150% versus last year, resulting in about 100 units per year.
  (The Nikkei Business Daily, 8／21）
  
• Makuhari Procurement develops UV curable hard-coates to protect surfaces of LCD & polarizing plates etc..
  (The NIkkan Kogyo Shimbun, 8／21）
  
• Idemitsu Kosan puts new products of adamantane derivatives applicable for 32 nanometers line widths photoresists on the markets.
  (The NIkkan Kogyo Shimbun, 8／26）
  

• Pioneer succeeds in developping a 16-layer read-only optical disc with a capacity of 400 gigabytes for the first time in the world.
  (The Nikkei Business Daily, 7／8）
  
• Hitachi Chemical to construct a research center for dry film resists(DFR) technology at Suzhou in China, which is available in 2009. Hitachi Chemicalsupplies now about 30% DFR of the world's demand which is estemated about 800 million square meters.
  (The Chemical Daily, 7／18）
  
• Univ. of Hyogo to install a laboratory in it's synchrotron radiation facility 「New SUBARU」 to characterize EUV resists.
  (The NIkkan Kogyo Shimbun, 7／25）
  

• Advanced Industrial Science and Technology suceeds in the micropatterning by UV irradiation using photodimerization of anthracene.
  (The Chemical Daily, 6／3）
  
• Matsushita Electric Works and Hyogo Prefecture Technology Center for Aguricultural, Forestry and Fishers develop new system which retards powdery mildew of fruits such as strawberry by photo-irradiation.
  (The Nikkei Business Daily, 6／4）
  
• Kobe Univ. and Yumex develop new UV source which uses gadolinium instead of mercury. The emission efficiency is double in comparison with the the conventional.
  (The Chemical Daily, 6／18）
  

• Japan Irradiation Service to construct new EB irradiation facility with 5 MeV of maximum EB energy at Naka county, Ibaraki prefecture, being opereted next April.
  (The Chemical Daily, 5／1）
  
• Prof. Honma and others of Kanto Gakuin Univ. develop new plastic plating process utilizing UV irradiation.
  (The NIkkan Kogyo Shimbun, 5／1）
  
• SunriseMSI develops new UV curable adhesives for tarnsparent plastics such as acrylics.
  (The Chemical Daily, 5／2）
  
• Coattec puts new light-weight UV irradiation devices applicable to field operations on the market.
  (The Chemical Daily, 5／12）
  
• NHV to construct new EB irradiation facility at Tosu city, Saga prefecture, being operated this October.
  (The Chemical Daily, 5／14）
  
• DOWA electronics develops deep ultraviolet LED chips, with wavelength 325-350nm, power 2mw, being the world' highest level.
  (The Chemical Daily, 5／16）
  
• Tomoegawa develops anisotropic diffusion films applicable to the display use, which are prepared through self-organized reactions between photo-polymerizable components with different refractive indices.
  (The Chemical Daily, 5／20）
  
• Semiconductor exposure devices makers to focus double patterning lithography process, giving up high refractive index-immesion lithography, being EUV lithography troubled with insufficient output power.
  (The NIkkan Kogyo Shimbun, 5／22）
  

• Associate prof. Mizuno of Waseda Univ. and Topppan Printing and Toyo Gosei codevelop new LSI multilayer interconnect process utilizing UV nanoimprint technology.
  (The Nikkei Business Daily, 4／16）
  
• Sony Chemical & Information Device develops new optical elastic resin for small LCD, which cure sufficiently in the case of black printings by UV and heating processes.
  (The Chemical Daily, 4／17）
  
• Nippon Paint develops UV curable stumpy surface-forming materials which prevent blots from the LCD surfaces.
  (The Chemical Daily, 4／18）
  
• EINS installs new 10 colors UV printer equipped with inline stamping process for the first time in Asia.
  (The Chemical Daily, 4／23）
  

• JSR develops 32nm line and space patterns for 22nm node semiconductor devices by using a "freezing material" for double patterning, such as double exposure/double etch or double exposure/single etch.
  (The NIkkan Kogyo Shimbun, 3／12）
  
• BASF Coatings Japan puts UV curable automotive refinish systems on the market.
  (The Chemical Daily, 3／25）
  
• Recent developments in UV curable performance materials( Prof. Nishikubo of Kanagawa Univ. )
  (The Chemical Daily, 3／28）
  
• Associate prof. Someya and others of Tokyo Univ. develop the technology to fabricate metallic electrodes on the organic semiconductor layers using inkjet printing techniques, which could be used on the organic EL wide televisions.
  (The Nikkei Business Daily, 3／28）
  

• Mitsubishi Rayon develops new acrylic resin films which could eliminate coatings from the molded articles. Acrylic resin films are laminated with UV curable resin which is cured after the insert molding, resulting in good abrasion resistance and moldability.
  (The Chemical Daily, 2／6）
  
• JSR puts new ArF liquid exposure photoresists, modified topcoates and topcoate-free types on the market.
  (The Chemical Daily, 2／27）
  
• The Kansai Electric Power to construct new irradiation facility at Mihama-cho in Fukui Prefecture, where 10MeV electron beam irradiation device to be installed. New company "Kansai Electron Beam" starts this march.
  (The Nikkei Business Daily, 2／27）
  

Central Glass concludes a contract concerning joint researches about photoresist materials with IBM .
(The Nikkei Business Daily, 1／11）

• SunriseMSI develops UV curable adhesives for temporary fixing which could be peel with normal temperature water.
  (The Chemical Daily, 1／21）
  
• Aqua Science commercializes steam cleaning devices for the semiconductor wafer processing, such as photoresist strips removal and wafer cleaning.
  (The NIkkan Kogyo Shimbun, 1／21）
  
• Sartomer begins to operate new facility in China, Guangzhou this Feb, producing specific acrylates & methacrylates monomers & oligomers for UV curable resins and its capacity 16000t/y. Sartomer is now a chemical division of Total in France.
  (The Chemical Daily, 1／24）
  
• NTT Basic Research Laboratories succeeds in incrasing LED-UV emission intensity as 600% as high comparing with the traditional system, improving the crystal faces of semiconductors.
  (The Nikkei Business Daily, 1／25）
  

* Miyakawa Office presents articles by permission of The Chemical Daily, Nikkei Business Daily, Nikkan Kogyo Shinbun.